Chemical vapor deposition apparatus
AssigneeSamsung Electronics Co., Ltd.
InventorHo Lee
Life of this patent
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Abstract
A chemical vapor deposition apparatus is provided, which includes: a chamber having an inner space; a gas feed member for supplying a gas into the chamber; a susceptor disposed in the chamber and supporting a substrate; a diffuser partitioning the inner space of the chamber into first and second partitions and having a plurality of holes connecting the first partition and the second partition for gas communication; a diffuser frame incorporated into the diffuser; and an insulating frame disposed between the chamber and the diffuser.
Claims9
A chemical vapor deposition apparatus comprising:
- a chamber having an inner space;
- a gas feed member for supplying a gas into the chamber;
- a susceptor disposed in the chamber and supporting a substrate;
- a diffuser partitioning the inner space of the chamber into first and second partitions and having a plurality of holes connecting the first partition and the second partition for gas communication;
- and
- an insulating frame disposed between the chamber and the diffuser,
- wherein the diffuser includes an extension overlapping a surface of the insulating frame.
A chemical vapor deposition apparatus comprising:
- a chamber having an inner space;
- a gas feed member for supplying a gas into the chamber;
- a susceptor disposed in the chamber and supporting a substrate;
- a diffuser partitioning the inner space of the chamber into first and second partitions and having a plurality of holes connecting the first partition and the second partition for gas communication;
- a diffuser frame incorporated into the diffuser;
- and
- an insulating frame disposed between the chamber and the diffuser.
Dependencies are inferred from the claim text.