Process for production of a carboxylic acid/diol mixture suitable for use in polyester production
AssigneeEastman Chemical Company
InventorsRobert Lin, Timothy Alan Upshaw, Duane Alan Hall, Kenny Randolph Parker
Life of this patent
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Abstract
The present invention relates to a process by which a carboxylic acid/diol mixture is obtained from a carboxylic acid/solvent slurry without isolation of a substantially dry carboxylic acid solid. More specifically, the present invention relates to a process by which a terephthalic acid/ethylene glycol mixture is obtained from a terephthalic acid/solvent slurry without isolation of a substantially dry terephthalic acid solid.
Claims34
A process for producing a carboxylic acid/diol mixture, said process comprising adding a diol to a water-wet carboxylic acid cake in a carboxylic acid/diol mixing zone to remove a portion of the water to form said carboxylic acid/diol mixture.
A process for producing a carboxylic acid/diol mixture, said process comprising the following steps:
- (a) removing in a first solid-liquid separation device impurities from a carboxylic acid/solvent slurry to form a carboxylic acid cake with acetic acid and a solvent mother liquor stream;
- (b) removing a substantial portion of a solvent in a second solid-liquid separation device from said carboxylic acid cake with acetic acid to form a water-wet carboxylic acid cake and a solvent/water byproduct liquor;
- (c) adding a diol to said water-wet carboxylic acid cake in a carboxylic acid/diol mixing zone to remove a portion of the water to form said carboxylic acid/diol mixture.
A process for producing a carboxylic acid/diol mixture, said process comprising the following steps:
- (a) removing a solvent from a carboxylic acid/solvent slurry in a solid-liquid separation zone;
- wherein a substantial portion of the solvent in said carboxylic acid/solvent slurry is replaced with water to form a water-wet carboxylic acid cake.
- (b) adding a diol to said water-wet carboxylic acid cake in a carboxylic acid/diol mixing zone to remove a portion of the water to form said carboxylic acid/diol mixture.
A process for producing a terephthalic acid/diol mixture, said process comprising adding a diol to a water-wet terephthalic acid cake in a terephthalic acid/diol mixing zone to remove a portion of the water to form said terephthalic acid/diol mixture.
A process for producing a terephthalic acid/diol mixture, said process comprising the following steps:
- (a) removing in a first solid-liquid separation device impurities from a terephthalic acid/solvent slurry to form a terephthalic acid cake with acetic acid.
- (b) removing a substantial portion of a solvent in a second solid-liquid separation device from said terephthalic acid cake with acetic acid to form a water-wet terephthalic acid cake;
- and
- (c) adding a diol to said water-wet terephthalic acid cake in a terephthalic acid/diol mixing zone to remove a portion of the water to form said terephthalic acid/diol mixture.
A process for producing a terephthalic acid/diol mixture, said process comprising the following steps:
- (a) removing a solvent from a terephthalic acid/solvent slurry in a solid-liquid separation zone;
- wherein a substantial portion of the solvent in said terephthalic acid/solvent slurry is replaced with water to form a water-wet terephthalic acid cake.
- (b) adding a diol to said water-wet terephthalic acid cake in a terephthalic acid/diol mixing zone to remove a portion of the water to form said terephthalic acid/diol mixture.
A process to produce a carboxylic acid/diol mixture from a carboxylic acid/solvent slurry without the isolation of a substantially dry carboxylic acid solid.
A process to produce a terephthalic/diol mixture from a terephthalic acid/solvent slurry without the isolation of a substantially dry terephthalic acid solid.
A process for producing a terephthalic acid/diol mixture, said process comprising the following steps:
- (a) removing in a first solid-liquid separation device impurities from a terephthalic acid/solvent slurry to for a terephthalic acid cake with acetic acid;
- wherein said first solid-liquid separation device is operated at a temperature between about 40° C. to about 155° C .
- (b) removing a substantial portion of a solvent in a second solid-liquid separation device to form said terephthalic acid cake with acetic acid to form a water-wet terephthalic acid cake;
- wherein said second solid-liquid separation device is operated at a temperature between about 40° C. to about 155° C.
- (c) adding a diol to said water-wet terephthalic acid cake in a terephthalic acid/diol mixing zone to remove a portion of the water to form said terephthalic acid/diol mixture;
- wherein said adding occurs at a temperature between about 40° C. and 290° C.;
- wherein said diol is ethylene glycol.
A process for producing a terephthalic acid/diol mixture, said process comprising the following steps in the order named:
- (a) removing in a first solid-liquid separation device impurities from a terephthalic acid/solvent slurry to form a terephthalic acid cake with acetic acid;
- wherein said first solid-liquid separation device is operated at a temperature between about 40° C. to about 155° C.;
- (b) removing a substantial portion of a solvent in a second solid-liquid separation device to form said terephthalic acid cake with acetic acid to form a water-wet terephthalic acid cake;
- wherein said second solid-liquid separation device is operated at a temperature between about 40° C. to about 155° C.;
- and
- (c) adding a diol to said water-wet terephthalic acid cake in a terephthalic acid/diol mixing zone to remove a portion of the water to form said terephthalic acid/diol mixture;
- wherein said adding occurs at a temperature between about 40° C. and 290° C.;
- wherein said diol is ethylene glycol.
Dependencies are inferred from the claim text.