Production of electronic devices by solution processing

A method of producing an electronic device by solution processing including depositing on a substrate two spaced channels of conductive material of controlled lateral width to form two electrodes of a transistor device, wherein the two spaced channels are formed by depositing fluid including the conductive material or a precursor thereto onto respective zones of a substrate surface defined by three longitudinal barriers including a central barrier and two outer barriers, wherein the two outer barriers are structured to facilitate controlled spillage of excess fluid out of the zones away from the central barrier and thereby avoid undesirable interconnection of the two channels.

A substrate for use in the production of an electronic device by solution processing, the substrate having provided on a surface thereof at least two opposed barriers for together controlling the spread of fluid including a device material or a precursor thereto deposited on a zone therebetween, at least one of the barriers structured so as to facilitate controlled spillage of excess fluid out of the zone to one or more selected locations.

A substrate for producing by solution processing an electronic device including two spaced conductive channels of controlled lateral width as two electrodes of a transistor device, wherein the substrate surface includes three longitudinal barriers comprising a central barrier and two outer barriers which together define two longitudinal zones for receiving fluid including a conductive material or a precursor thereto to form the two spaced conductive channels of controlled lateral width, and wherein the two outer barriers are structured so as to facilitate controlled spillage of excess fluid out of the zones away from the central barrier and thereby avoid interconnection of the two channels.

A method of producing an electronic device by solution processing including longitudinally depositing fluid containing a device material or a precursor thereto on a patterned substrate to form a plurality of spaced longitudinal channels of said device material of controlled lateral width, wherein the substrate is patterned such that at least one lateral connection between at least one pair of adjacent channels is formed at at least one selected location without the need to carry out any lateral deposition of said fluid.

A substrate for use in producing an electronic device by solution processing, the substrate patterned to define at least three adjacent longitudinal zones for forming at least three adjacent longitudinal channels of device material of a controlled width by the longitudinal deposition in the at least three zones of fluid including such device material or a precursor thereto, and wherein the substrate is further patterned such that, in use, longitudinal deposition of said fluid at corresponding locations in each of the three adjacent zones can result in a lateral connection automatically formed between only two of the resulting three longitudinal channels.