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US 2004/0175947 A1Published application
Method for growing thin films
AssigneeLSI Logic Corporation
InventorsSheldon Aronowitz, Vladimir Zubkov, Richard Schinella
Life of this patent
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Abstract
A method of forming a layer over a substrate is provided. Generally, a layer of a first reactive species is deposited over the substrate. The layer of the first reactive species is reacted with a second reactive species to create a first product. Unreacted reactive species is preferentially desorbed leaving a layer of the first product.
Claims17
A method of forming a layer over a substrate, comprising:
- depositing a layer of a first reactive species over the substrate;
- chemically reacting the layer of the first reactive species with a second reactive species to create a first product;
- and
- preferentially desorbing an unreacted reactive species leaving a layer of the first product.
1 more element
A thin film of a plurality of layers over a substrate, wherein each layer is individually formed by the method, comprising:
- depositing a layer of a first reactive species over the substrate;
- chemically reacting the layer of the first reactive species with a second reactive species to create a first product;
- and
- preferentially desorbing an unreacted reactive species leaving a layer of the first product.
1 more element
Dependencies are inferred from the claim text.