Back to results
US 2004/0175656 A1Published application
Photo-patternable nanomaterials
OwnerEric Baer, P. Anne Hiltner +1inventors
InventorsEric Baer, P. Anne Hiltner, Christoph Weder
Life of this patent
Estimating the term…
Abstract
Light-reflecting multilayer polymer films that irreversibly change their optical characteristics upon exposure to suitable, high-intensity irradiation.
Claims13
A multilayer structure comprising,
- a plurality of at least two alternating layers A and B represented by formula (AB)x, where x=2n, and n is in the range of from 4 to 15;
- and
- wherein layer A is comprised of components (a) and layer (B) is comprised of component (b);
- and wherein component (a) comprises a matrix polymer and component (b) comprises a matrix polymer and a photoreactive compound dispersed therein.
1 more element
Dependencies are inferred from the claim text.