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US 2004/0175645 A1Published application
Photosensitive resin composition
AssigneeFuji Photo Film Co., Ltd.
InventorsTomoya Sasaki, Kazuyoshi Mizutani, Shinichi Kanna
Life of this patent
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Abstract
The photosensitive resin composition comprising: (A) a resin containing (A1) a repeating unit having at least two groups represented by the specific general formula; and (B) a compound capable of generating an acid by the action with one of an actinic ray and a radiation.
Claims24
A photosensitive resin composition comprising:
- (A) a resin containing (A1) a repeating unit having at least two groups represented by the following general formula (Z),
- wherein the resin is alkali-soluble, or the resin is decomposed by the action of an acid to increase its solubility in an alkaline aqueous solution;
- and
- (B) a compound capable of generating an acid by the action with one of an actinic ray and a radiation:
- 119
- wherein R50 to R55 each independently represents a hydrogen atom, a fluorine atom, or an optionally substituted alkyl group, provided that at least one of R50 to R55 represents a fluorine atom or an alkyl group in which at least one hydrogen atom is substituted with a fluorine atom;
- and R represents a hydrogen atom or an organic group.
4 more elements
Dependencies are inferred from the claim text.