Substrate processing apparatus and method for the controlled formation of layers including self-assembled monolayers

Abstract

Substrate processing methods and apparatuses are disclosed. One embodiment of the invention is directed to a substrate processing apparatus for processing an analytical substrate. The apparatus includes a substrate holder for holding a substrate and a processing chamber including an opening for receiving the substrate holder and the substrate. A fluid inlet and a fluid outlet are in the processing chamber. A washing device adapted to supply a wash liquid to the substrate while the substrate is in the processing chamber. A liquid removal device adapted to dry the substrate when the substrate is being withdrawn from the processing chamber.

Dependencies are inferred from the claim text.