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AssigneePhotodigm, Inc.
InventorsJay Bernard Kirk, Zuhair Hilali, Duy Phan, Darren S. Lee, Duane E. Carter, Gary A. Evans, David Alan Willis
Estimating the term…
A uniform coating is provided using surface features. Multiple ridges or other shapes are fabricated near an area of interest to allow for uniform coating in between the ridges. Areas at either ends of the ridges are left open to allow for excess pooling of photoresist liquid and to aid in obtaining uniform coating. The photoresist liquid or other coating fluid is applied to the sample and spun dry. A soft-bake process is performed to evaporate remaining solvents. An element, such as a diffractive, refractive, or reflective grating structure, is then formed in the area of interest using the uniform photoresist coating.
A method for forming a photoresist coating on a substrate, wherein the substrate includes at least one pre-existing surface feature out of the surface of the substrate, the method comprising:
An apparatus for forming a photoresist coating on a substrate, wherein the substrate includes at least one pre-existing surface feature out of the surface of the substrate, the apparatus comprising:
A wafer, comprising:
Dependencies are inferred from the claim text.