Photoprotective cosmetic compositions containing aromatic amide, sulphonamide or carbamate derivatives of acrylonitrile and novel aromatic amide, sulphonamide or carbamate derivatives of acrylonitrile

Cosmetic composition for topical use, in particular intended for photoprotecting the skin and/or the hair, containing, in a cosmetically acceptable support, at least one compound of formula (1) or (2)

• 20
• in which
• X1 represents a radical R3—(C═O)—, R3—SO2— or
• R3—O—(C═O)—,
• X2 represents a divalent radical of formula —(C═O)—R′3—(C═O)—, —SO2—R′3—SO2— or —(C═O)—O—R′3—(C═O)—,
• Y represents a radical —(C═O)—R4 or —SO2R5,
• R2 represents a linear or branched C1-8 alkyl group,
• n is 0, 1 or 2,
• R3 represents a linear or branched C1-30 alkyl or C3-30 alkenyl radical, possibly bearing one or more hydroxyl substituents and possibly containing, in the carbon chain, one or more hetero atoms chosen from oxygen, nitrogen and silicon atoms,
• R′3 represents a single bond or a linear or branched divalent C1-30 alkylene or C3-30 alkenylene radical, possibly bearing one or more hydroxyl substituents and possibly containing, in the carbon chain, one or more hetero atoms chosen from oxygen, nitrogen and silicon atoms,
• R4 represents a radical —OR6 or —NHR6,
• R5 represents a linear or branched C1-30 alkyl radical or a phenyl nucleus that is unsubstituted or substituted with C1-4 alkyl or alkoxy radicals,
• R6 represents a linear or branched C1-30 alkyl or C3-30 alkenyl radical, possibly bearing one or more hydroxyl substituents and possibly containing, in the carbon chain, one or more hetero atoms chosen from oxygen, nitrogen and silicon atoms.