Specimen surface processing apparatus and surface processing method

A sample surface processing apparatus, comprising:

• a vacuum chamber;
• a plasma source for generating a plasma in the vacuum chamber;
• a sample stage for mounting a sample thereon;
• and a power source for applying a high frequency bias to the sample, wherein the surface processing of the sample is performed by the plasma, and
• said apparatus further comprising:
• means for introducing an oxygen gas or a mixed gas of an oxygen gas and a fluorine-containing gas into the vacuum chamber;
• and means for selectively supplying the oxygen gas or the mixed gas according to the surface state of the sample, and performing the surface processing of the sample within the scope of a processing pressure of not more than 2 Pa and a frequency of the plasma source of not less than 100 MHz.

A sample surface processing method by a sample processing apparatus comprising:

• a vacuum chamber;
• means for generating a plasma in the vacuum chamber;
• a sample stage for mounting a sample to be processed thereon;
• and a power source for applying a high frequency bias to the sample, wherein the surface processing of the sample is performed by the plasma,
• said method comprising:
• introducing a mixed gas of an oxygen gas and a fluorine-containing gas into the vacuum chamber;
• performing surface processing of the sample by the plasma;
• monitoring the plasma emission intensity of a reaction product in the vacuum chamber, and the changes in interference light;
• and
• automatically determining the state of the surface processing based on the monitor result, and performing switching between supplying the oxygen gas and the mixed gas, and switching of the high frequency bias.