Thin film forming device, method of forming a thin film, and self-light-emitting device
AssigneeSemiconductor Energy Laboratory Co., Ltd.
InventorsShunpei Yamazaki, Masaaki Hiroki, Noriko Ishimaru
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Abstract
Measure of forming an EL layer by selectively depositing through evaporation a material for forming the EL layer at a desired location is provided. When a material for forming an EL layer is deposited, a mask (113) is provided between a sample boat (111) and a substrate (110). By applying voltage to the mask (113), the direction of progress of the material for forming the EL layer is controlled to be selectively deposited at a desired location.
Claims17
A method of forming a thin film,
- wherein a sample boat having an EL material contained therein, a substrate having an electrode provided thereon, and a mask between the sample boat and the substrate are provided,
- wherein the EL material is made to be in a vapor state in the sample boat,
- wherein the EL material is in the vapor state is discharged from the sample boat toward the substrate, and
- wherein the EL material in the vapor state is made to pass through an opening of the mask corresponding to the electrode to deposit the EL material on the electrode on the substrate and form a thin film.
A thin film forming device comprising:
- a sample boat having an EL material contained therein;
- means for making the EL material in a vapor state in the sample boat;
- a substrate having an electrode provided thereon;
- a mask between the sample boat and the substrate;
- and
- means for applying voltage to the mask.
A method of forming a thin film,
- wherein a sample boat having an EL material contained therein, a substrate having an electrode provided thereon, and a mask between the sample boat and the substrate are provided,
- wherein the EL material is made to be in a vapor state in the sample boat,
- wherein the EL material is in the vapor state is discharged from the sample boat toward the substrate,
- wherein the EL material in the vapor state is made to pass through an opening of the mask corresponding to the electrode to deposit the EL material on the electrode on the substrate and form a thin film, and
- wherein voltage is applied to the mask.
A method of forming a thin film,
- wherein a sample boat having an EL material contained therein, a substrate having an electrode provided thereon, and a mask between the sample boat and the substrate are provided,
- wherein the EL material is made to be in a vapor state in the sample boat,
- wherein the EL material is in the vapor state is discharged from the sample boat toward the substrate,
- wherein the EL material in the vapor state is made to pass through an opening of the mask corresponding to the electrode to deposit the EL material on the electrode on the substrate and form a thin film, and
- wherein the EL material in the vapor state is charged.
A thin film forming device comprising:
- a sample boat having an EL material contained therein;
- means for making the EL material in a vapor state in the sample boat;
- a substrate having an electrode provided thereon;
- a mask between the sample boat and the substrate;
- means for applying voltage to the mask;
- and
- means for charging the EL material in the vapor state.
Dependencies are inferred from the claim text.