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US 2004/0170921 A1Published application
Electron beam recording substrate
AssigneePioneer Corporation
InventorMasahiko Katsumura
Life of this patent
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Abstract
An electron beam recording substrate which holds a resist film where electron beam information recording is carried out and which has a surface layer area made of a material that suppresses enlargement of a scattering distribution diameter of electrons spread inside by irradiation of an electron beam from a resist film side.
Claims9
An electron beam recording substrate where electron beam information recording is carried out comprising:
- a substrate main body;
- a resist film relative to the substrate main body;
- and a surface layer area made of a material that suppresses enlargement of a scattering distribution diameter of electrons spread inside by irradiation of an electron beam from a resist film side.
Dependencies are inferred from the claim text.