Resist compositions

A resist composition comprising:

• at least one kind of polymer containing,as components thereof, a monomer unit represented by the following general formula [1]:
• 26
• [wherein, R1 is a hydrogen atom or a methyl group];
• a monomer unit represented by the following general formula [2]:
• 27
• [wherein, R1 is the same as described above;
• R2 is a hydrogen atom or a linear or a branched alkyl group having 1-4 carbon atoms];
• and a monomer unit represented by the following general formula [3]:
• 28
• [wherein, R1 is the same as described above;
• R3 is an acid labile group which can be easily eliminated by an action of acid and bonded to a carboxylic acid to form an ester linkage];
• at least one kind of compound to generate an acid by irradiation of radioactive ray, represented by the following general formula [4]:
• 29
• [wherein, each of R5 and R7 is independently a hydrogen atom or an electron-withdrawing group (with a proviso of excluding the case when both of R5 and R7 are simultaneously hydrogen atoms);
• each of R4, R6 and R8 is independently a hydrogen atom or a halogen atom;
• each of R9 and R10 is independently a hydrogen atom, a halogen atom, a linear or a branched alkyl group having 1-4 carbon atoms, a linear or a branched alkoxy group having 1-4 carbon atoms, a linear or a branched alkoxycarbonyloxy group having 2-5 carbon atoms or a cyclic acetal group having 4-5 carbon atoms;
• n is an integer of 1-3];
• an organic basic compound;
• and a solvent.