Complex oxide, and production process therefor and applications thereof
AssigneeShowa Denko K.K.
InventorsHisao Kogoi, Jun Tanaka, Hiroyuki Hagihara
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Abstract
The present invention relates to a complex oxide having a BET specific surface area of about 10 to about 200 m2/g, comprising zinc oxide as a primary component, containing crystalline structures of both zinc oxide and silica, and exhibiting diffraction peaks in lattice planes (100), (002), and (101), which are X-ray crystallographically specific to diffraction peaks of crystalline zinc oxide, and in a lattice plane (101) which is X-ray crystallographically specific to the diffraction peak of crystalline silica.
Claims31
A complex oxide having a BET specific surface area of about 10 to about 200 m2/g, comprising zinc oxide as a primary component, containing crystalline structures of both zinc oxide and silica, and exhibiting diffraction peaks in lattice planes (100), (002), and (101), which are X-ray crystallographically specific to diffraction peaks of crystalline zinc oxide;
- and in a lattice plane (101) which is X-ray crystallographically specific to the diffraction peak of crystalline silica.
A process for producing a complex oxide according to claims, wherein the Zn raw material gas is fed into the reactor through a plurality of nozzles.
Dependencies are inferred from the claim text.