EUV, XUV, and X-Ray wavelength sources created from laser plasma produced from liquid metal solutions, and nano-size particles in solutions
AssigneeUniversity of Central Florida
InventorMartin Richardson
Life of this patent
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AssigneeUniversity of Central Florida
InventorMartin Richardson
Estimating the term…
Special liquid droplet targets that are irradiated by a high power laser and are plasmarized to form a point source EUV, XUV and x-ray source. Various types of liquid droplet targets include metallic solutions, and nano-sized particles in solutions having a melting temperature lower than the melting temperature of some or all of the constituent metals, used a laser point source target droplets. The solutions have no damaging debris and can produce plasma emissions in the X-rays, XUV, and EUV(extreme ultra violet) spectral ranges of approximately 0.1 nm to approximately 100 nm, approximately 11.7 nm and 13 nm, approximately 0.5 nm to approximately 1.5 nm, and approximately 2.3 nm to approximately 4.5 nm. The second type of target consists of various types of liquids which contain as a miscible fluid various nano-size particles of different types of metals and non-metal materials.
A method of generating optical emissions from metallic point sources, comprising the steps of:
Dependencies are inferred from the claim text.