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US 2004/0169940 A1Published application
Retainer
AssigneeCanon Kabushiki Kaisha
InventorSetsuo Yoshida
Life of this patent
Estimating the term…
Abstract
A retainer for holding a rotationally symmetrical optical element, includes a retaining member that holds the optical element via three support parts arranged at approximately 120° intervals, and a joint member that joints the optical element with the retaining member, wherein |(zb−0.6wb)−(zg+1.2)|≦1 is met, where zg is a coordinate of a gravity center of the optical element, zb is a coordinate of a center position of a width of said joint member in the z axis direction by which said joint member contacts the optical element, and wb is the width of said joint member in the z axis direction by which said joint member contacts the optical element.
Claims10
A retainer for holding an optical element, the optical element according a center axis of the optical element with a gravity direction, and having an approximately rotationally symmetrical shape, said retainer comprising:
- a retaining member that includes three support parts arranged at approximately 120° intervals around the center axis, and holds the optical element via the support parts;
- and
- a joint member that joints the optical element with the retaining member,
- wherein |(zb−0.6wb)−(zg+1.2)|≦1 is met, where a Z coordinate system has an origin at an intersection between the center axis and a surface of the optical element, which surface faces a direction opposite to the gravity direction, and sets a Z axis to be positive in the direction opposite to the gravity direction of the center axis, zg is a coordinate of a gravity center of the optical element in the Z coordinate system, zb is a coordinate of a center position of a width of said joint member in the z axis direction by which said joint member contacts the optical element in the Z coordinate system, and wb is the width of said joint member in the z axis direction by which said joint member contacts the optical element.
1 more element
An optical system comprising:
- an optical element that accords a center axis of the optical element with a gravity direction, and has an approximately rotationally symmetrical shape, and
- a retainer for holding said optical element,
- wherein said retainer includes:
- a retaining member that includes three support parts arranged at approximately 120° intervals around the center axis, and holds the optical element via the support parts;
- and
- a joint member that joints the optical element with the retaining member,
- wherein |(zb−0.6wb)−(zg+1.2)|≦1 is met, where a Z coordinate system has an origin at an intersection between the center axis and a surface of the optical element, which surface faces a direction opposite to the gravity direction, and sets a Z axis to be positive in the direction opposite to the gravity direction of the center axis, zg is a coordinate of a gravity center of the optical element in the Z coordinate system, zb is a coordinate of a center position of a width of said joint member in the z axis direction by which said joint member contacts the optical element in the Z coordinate system, and wb is the width of said joint member in the z axis direction by which said joint member contacts the optical element.
4 more elements
An optical apparatus comprising:
- plural optical elements;
- and
- a retainer for holding at least one of said optical elements, which one accords a center axis of the optical element with a gravity direction, and has an approximately rotationally symmetrical shape,
- wherein said retainer includes:
- a retaining member that includes three support parts arranged at approximately 120° intervals around the center axis, and holds the optical element via the support parts;
- and
- a joint member that joints the optical element with the retaining member,
- wherein |(zb−0.6wb)−(zg+1.2)|≦1 is met, where a Z coordinate system has an origin at an intersection between the center axis and a surface of the optical element, which surface faces a direction opposite to the gravity direction, and sets a Z axis to be positive in the direction opposite to the gravity direction of the center axis, zg is a coordinate of a gravity center of the optical element in the Z coordinate system, zb is a coordinate of a center position of a width of said joint member in the z axis direction by which said joint member contacts the optical element in the Z coordinate system, and wb is the width of said joint member in the z axis direction by which said joint member contacts the optical element.
5 more elements
An exposure apparatus comprising:
- a retainer for holding an optical element, the optical element according a center axis of the optical element with a gravity direction, and having an approximately rotationally symmetrical shape, said retainer including a retaining member that includes three support parts arranged at approximately 120° intervals around the center axis, and holds the optical element via the support parts, and a joint member that joints the optical element with the retaining member, wherein |(zb−0.6wb)−(zg+1.2)|≦1 is met, where a Z coordinate system has an origin at an intersection between the center axis and a surface of the optical element, which surface faces a direction opposite to the gravity direction, and sets a Z axis to be positive in the direction opposite to the gravity direction of the center axis, zg is a coordinate of a gravity center of the optical element in the Z coordinate system, zb is a coordinate of a center position of a width of said joint member in the z axis direction by which said joint member contacts the optical element in the Z coordinate system, and wb is the width of said joint member in the z axis direction by which said joint member contacts the optical element;
- and
- an optical system for exposing a pattern formed on a mask or reticle onto an object via the optical element held by the retainer.
A device fabrication method comprising the steps of:
- exposing a pattern on a mask, onto an object by using an exposure apparatus;
- and
- developing the object that has been exposed,
- wherein said exposure apparatus includes:
- a retainer for holding an optical element, the optical element according a center axis of the optical element with a gravity direction, and having an approximately rotationally symmetrical shape, said retainer including a retaining member that includes three support parts arranged at approximately 120° intervals around a center axis of the optical element, and holds the optical element via the support parts, and a joint member that joints the optical element with the retaining member, wherein |(zb−0.6wb)−(zg+1.2)|≦1 is met, where a Z coordinate system has an origin at an intersection between the center axis and a surface of the optical element, which surface faces a direction opposite to the gravity direction, and sets a Z axis to be positive in the direction opposite to the gravity direction of the center axis, zg is a coordinate of a gravity center of the optical element in the Z coordinate system, zb is a coordinate of a center position of a width of said joint member in the z axis direction by which said joint member contacts the optical element in the Z coordinate system, and wb is the width of said joint member in the z axis direction by which said joint member contacts the optical element;
- and
- an optical system for exposing a pattern formed on a mask or reticle onto an object via the optical element held by the retainer.
4 more elements
Dependencies are inferred from the claim text.