System and methods for classifying anomalies of sample surfaces
AssigneeKLA-Tencor Corporation
InventorsWayne Chen, Andrew Zeng, Mustafa Akbulut
Life of this patent
Estimating the term…
Abstract
Two or more defect maps may be provided for the same sample surface at different detection sensitivities and/or processing thresholds. The defect maps may then be compared for better characterization of the anomalies as scratches, area anomalies or point anomalies. This can be done without concealing the more significant and larger size defects amongst numerous small and immaterial defects. One or more defect maps can be used to report the anomalies with classified information; the results from this map(s) can be used to monitor the process conditions to obtain better yield.
Claims48
A method for detecting and classifying anomalies of a surface of a sample of a material suitable for use as a substrate for storage, display or electronic devices, comprising:
- supplying radiation to the surface;
- detecting radiation from the anomalies of the surface and supplied to the surface to provide an output;
- analyzing the output for anomalies and classifying the anomalies;
- and
- varying sensitivity in detecting radiation from the anomalies or a threshold in analyzing the output and using two outputs provided at two or more different sensitivities or two or more different thresholds to arrive at at least one classification of the anomalies.
13 The method of claim 12, wherein the elongated group of anomalies includes macroscratches and microscratches.
24 The method of claim 1, further comprising controlling a sample processing parameter in response to the at least one classification.
A method for classifying anomalies of a surface of a sample of a material suitable for use as a substrate for storage, display or electronic devices, comprising:
- obtaining information concerning anomalies of the surface;
- processing the information using a first threshold to provide a first output;
- processing the information using a second threshold different from the first threshold to provide a second output;
- and
- analyzing the outputs and classifying the anomalies in at least one classification.
40 The method of claim 25, further comprising controlling a sample processing parameter in response to the at least one classification.
A system for detecting and classifying anomalies of a surface of a sample of a material suitable for use as a substrate for storage, display or electronic devices, comprising:
- a source supplying radiation to the surface;
- one or more detectors detecting anomalies of the surface by detecting radiation from the anomalies supplied to the surface to provide an output or outputs;
- and
- a processor processing the output(s) and classifying the anomalies in at least one classification, wherein said detectors detect the anomalies at at least two different sensitivities to provide the output(s) or said processor processes the output(s) at at least two different thresholds, to provide said at least one classification.
A system for detecting and classifying anomalies of a surface of a sample of a material suitable for use as a substrate for storage, display or electronic devices, and for controlling processing, comprising:
- a source supplying radiation to the surface;
- one or more detectors detecting anomalies of the surface by detecting radiation from the anomalies supplied to the surface to provide one or more outputs;
- a processor processing the one or more outputs and classifying the anomalies in at least one classification, wherein said detectors detect the anomalies at at least two different sensitivities to provide the output(s) or said processor processes the output(s) at at least two different thresholds, to provide said at least one classification;
- and
- a device processing the sample according to one or more processing parameters, wherein said device alters said one or more processing parameters in response to the at least one classification.
Dependencies are inferred from the claim text.