Method of producing an optical imaging system

A method of producing an optical imaging system, which has a plurality of optical elements, comprising:

• assembling the imaging system with the optical elements substantially arranged in predetermined positions;
• measuring the imaging system with locally resolving determination of the wavefront in the exit pupil or a surface conjugate therewith belonging to the imaging system, for the locally resolving determination of wavefront errors;
• selecting at least one surface provided as a correction surface on at least one of the optical elements, the correction surface being selected such that the correction surface is arranged in the surface of the exit pupil or a surface conjugate therewith belonging to the imaging system;
• calculating at least one of a topography and a refractive index distribution of at least one surface provided as the correction surface belonging to the optical element, in order to correct the wavefront error;
• removing the at least one optical element provided with the correction surface from the imaging system;
• locally resolving processing of the at least one correction surface, in order to produce at least one of the calculated topography and the refractive index distribution of the correction surface;
• and
• installing the optical element having the processed correction surface in the predetermined position for the optical element in the imaging system,
• wherein the locally resolving processing includes at least one of correct-coordinate shaping of the correction surface and locally changing the refractive index of the correction surface on the basis of data from the wavefront measurement.

A method of producing an optical imaging system, which has a plurality of optical elements, comprising:

• assembling the imaging system with the optical elements substantially arranged in predefined positions;
• measuring the imaging system with locally resolving determination of the wavefront in the exit pupil or a surface conjugate therewith belonging to the imaging system, for the locally resolving determination of wavefront errors;
• wherein the measurement of the wavefront errors is carried out simultaneously for a plurality of field points using a shearing interferometer with a two-dimensional wavefront source;
• selecting at least one surface provided as a correction surface on at least one of the optical elements, the correction surface being selected such that the correction surface is arranged in the surface of the exit pupil or a surface conjugate therewith belonging to the imaging system;
• calculating at least one of a topography and a refractive index distribution of at least one surface provided as the correction surface belonging to the optical element, in order to correct the wavefront error;
• removing the at least one optical element provided with the correction surface from the imaging system;
• locally resolving processing of the at least one correction surface, in order to produce at least one of the calculated topography and the refractive index distribution of the correction surface;
• and
• installing the optical element having the processed correction surface in the predetermined position of the optical element in the imaging system.

A method of producing an optical imaging system, which has a plurality of optical elements, comprising:

• assembling the imaging system with the optical elements substantially arranged in predetermined positions;
• measuring the imaging system with locally resolving determination of the wavefront in the exit pupil or a surface conjugate therewith belonging to the imaging system, for the locally resolving determination of wavefront errors;
• wherein the measuring of the imaging system is performed interferometrically, and whereby immediate determination of light path deviations via the exit pupil or a surface conjugate therewith belonging to the imaging system is permitted;
• selecting at least one surface provided as a correction surface on at least one of the optical elements, the correction surface being selected such that the correction surface is arranged in the surface of the exit pupil or an surface conjugate therewith belonging to the imaging system;
• mounting the optical element having the correction surface in a separate mount;
• calculating at least one of a topography and a refractive index distribution of at least one surface provided as the correction surface belonging to the optical element, in order to correct the wavefront error;
• removing the at least one optical element provided with a correction surface with the mount from the imaging system;
• locally resolving processing of the at least one correction surface of the optical element held in the mount, in order to produce at least one of the calculated topography and refractive index distribution of the correction surface;
• installing the optical element having the processed correction surface and held in the mount in the predetermined position of the optical element in the imaging system.