Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus using deflector

A deflector comprising:.

• an electrode substrate having a plurality of through holes, an electrode pair made up of first and second electrodes which oppose side walls of each through hole in order to control a locus of a charged particle beam passing through the through hole, and electrode wiring pads formed near said first and second electrodes and electrically connected to said first and second electrodes;
• and
• a wiring substrate having connection wiring pads connected to said electrode wiring pads of said electrode substrate to individually apply a voltage to said electrode pairs,
• wherein said electrode substrate and wiring substrate are bonded via said connection wiring pads of said wiring substrate and said electrode wiring pads of said electrode substrate.

A method of manufacturing a deflector by bonding an electrode substrate and wiring substrate, comprising steps of:

• preparing an electrode substrate having a plurality of through holes, and an electrode pair made up of first and second electrodes which oppose side walls of each through hole in order to control a locus of a charged particle beam passing through the through hole;
• preparing a wiring substrate having connection wiring pads to be connected to the electrode pairs of the electrode substrate to individually apply a voltage to the electrode pairs;
• and
• forming a beam aperture in a wiring layer of the wiring substrate before the electrode substrate and wiring substrate are bonded.

A method of manufacturing a deflector by bonding an electrode substrate and wiring substrate, comprising steps of:

• preparing an electrode substrate having a plurality of through holes, an electrode pair made up of first and second electrodes which oppose side walls of each through hole in order to control a locus of a charged particle beam passing through the through hole, and electrode wiring pads formed near said first and second electrodes and electrically connected to said first and second electrodes;
• preparing a wiring substrate having connection wiring pads to be connected to the electrode wiring pads of said electrode substrate to individually apply a voltage to said electrode pairs;
• and
• forming a beam aperture in a wiring layer of the wiring substrate before the electrode substrate and wiring substrate are bonded.

A charged particle beam exposure apparatus comprising:

• a charged particle source for emitting a charged particle beam;
• and
• a deflector for controlling an image formation position of the emitted charged particle beam, wherein said deflector comprises:
• an electrode substrate having a plurality of through holes, and an electrode pair made up of first and second electrodes which oppose side walls of each through hole in order to control a locus of a charged particle beam passing through the through hole;
• and
• a wiring substrate having connection wiring pads connected to said electrode pairs of said electrode substrate to individually apply voltages to said electrode pairs, and
• said deflector is formed by bonding said electrode substrate and wiring substrate via said connection wiring pads of said wiring substrate.

A charged particle beam exposure apparatus comprising:

• a charged particle source for emitting a charged particle beam;
• and
• a deflector for controlling an image formation position of the emitted charged particle beam,
• wherein said deflector comprises:
• an electrode substrate having a plurality of through holes, an electrode pair made up of first and second electrodes which oppose side walls of each through hole in order to control a locus of a charged particle beam passing through the through hole, and electrode wiring pads formed near said first and second electrodes and electrically connected to said first and second electrodes;
• and
• a wiring substrate having connection wiring pads connected to said electrode wiring pads of said electrode substrate to individually apply voltages to said electrode pairs, and said deflector is formed by bonding said electrode substrate and wiring substrate via said connection wiring pads of said wiring substrate and said electrode wiring pads of said electrode substrate.

A method of manufacturing a deflector by bonding an electrode substrate and wiring substrate, comprising steps of:

• preparing an electrode substrate having a plurality of through holes, and an electrode pair made up of first and second electrodes which oppose side walls of each through hole in order to control a locus of a charged particle beam passing through the through hole;
• and
• preparing a wiring substrate to be bonded to the electrode substrate,
• wherein in the wiring substrate preparation step, the wiring substrate comprises:
• holes extending through the wiring substrate in positions corresponding to the through holes formed in the electrode substrate;
• and
• an electrode electrically connected to side surfaces of the holes, a wiring layer surface at the holes, and a rear surface of the wiring substrate.

A deflector comprising:

• an electrode substrate having a plurality of openings, and a plurality of electrode pairs each made up of first and second electrodes which oppose through a corresponding one of the openings in order to deflect a charged particle beam passing through the corresponding opening;
• a first wiring substrate having a first interconnection for applying a first voltage to said first substrate;
• and
• a second wiring substrate having a second interconnection for applying a second voltage to said second electrode,
• wherein said electrode substrate is arranged between said first and second wiring substrates.

A deflector comprising:

• an electrode substrate having a plurality of openings, and a plurality of electrode pairs each made up of first and second electrodes which oppose through a corresponding one of the openings in order to deflect a charged particle beam passing through the corresponding opening;
• a wiring substrate having an interconnection for applying a predetermined voltage to said first electrode;
• and
• a ground substrate which applies a ground voltage to said second electrode, wherein said ground substrate is arranged in front of said electrode substrate and said wiring substrate with respect to a passing direction of the charged particle beam.

A charged particle beam exposure apparatus comprising a charged particle beam source and a deflector which deflects a charged particle beam emitted from said charged particle beam source,

• said deflector including:
• an electrode substrate having a plurality of openings, and a plurality of electrode pairs each made up of first and second electrodes which oppose through a corresponding one of the openings in order to deflect a charged particle beam passing through the corresponding opening;
• and
• a wiring substrate obtained by stacking a first wiring layer having a first interconnection for applying a first voltage to said first electrode and a second wiring layer having a second interconnection for applying a second voltage to said second electrode.

A charged particle beam exposure apparatus comprising a charged particle beam source and a deflector which deflects a charged particle beam emitted from said charged particle beam source,

• said deflector including:
• an electrode substrate having a plurality of openings, and a plurality of electrode pairs each made up of first and second electrodes which oppose through a corresponding one of the openings in order to deflect a charged particle beam passing through the corresponding opening;
• a first wiring substrate having a first interconnection for applying a first voltage to said first substrate;
• and
• a second wiring substrate having a second interconnection for applying a second voltage to said second electrode,
• wherein said electrode substrate is arranged between said first and second wiring substrates.

A charged particle beam exposure apparatus comprising a charged particle beam source and a deflector which deflects a charged particle beam emitted from said charged particle beam source,

• said deflector including:
• an electrode substrate having a plurality of openings, and a plurality of electrode pairs each made up of first and second electrodes which oppose through a corresponding one of the openings in order to deflect a charged particle beam passing through the corresponding opening;
• a wiring substrate having an interconnection for applying a predetermined voltage to said first electrode;
• and
• a ground substrate which applies a ground voltage to said second electrode,
• wherein said ground substrate is arranged nearer to said charged particle beam source than said electrode substrate and said wiring substrate.