Etching method
AssigneeCanon Kabushiki Kaisha
InventorsKazuhito Takanashi, Kenji Yamagata, Kiyofumi Sakaguchi, Kazutaka Yanagita, Takashi Sugai, Takashi Tsuboi
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Abstract
An object of this invention is to suppress the amount of etchant used. A liquid etchant is stored in an etchant vessel, and vaporized by a vaporization unit. A fragile layer such as a porous layer is selectively etched with the vaporized etchant.
Claims17
An etching method of etching a fragile layer of a member having the fragile layer, comprising:
- vaporizing a liquid etchant to etch the fragile layer of the member with the vaporized etchant.
An etching apparatus for etching a member, comprising:
- a reaction vessel which stores the member;
- and
- a vaporization unit which vaporizes a liquid etchant by heating.
An etching apparatus for etching a member, comprising:
- a reaction vessel which stores the member;
- and
- a vaporization unit which vaporizes a liquid etchant inside the reaction vessel,
- wherein the member stored in the reaction vessel is etched with the vaporized etchant.
An etching apparatus for etching a member, comprising:
- a reaction vessel which stores the member;
- an etchant vessel which is arranged outside the reaction vessel and stores a liquid etchant;
- a vaporization unit which vaporizes the etchant in the etchant vessel;
- a first supply path which supplies a predetermined gas into the etchant vessel;
- and
- a second supply path which communicates the etchant vessel with the reaction vessel,
- wherein the etchant vaporized in the etchant vessel is supplied into the reaction vessel via the second supply path by supplying the predetermined gas into the etchant vessel via the first supply path.
A substrate manufacturing method comprising steps of:
- preparing a first substrate having a fragile layer and a transfer layer formed on the fragile layer;
- bonding a surface of the transfer layer of the first substrate to a second substrate to fabricate a bonded substrate stack;
- dividing the bonded substrate stack at a portion of the fragile layer;
- and
- etching the fragile layer remaining on the transfer layer transferred to the second substrate,
- wherein the etching step includes a step of vaporizing a liquid etchant and etching the remaining fragile layer with the vaporized etchant.
Dependencies are inferred from the claim text.