Substrate for forming specific pattern, and method for manufacturing the same
AssigneeSeiko Epson Corporation
InventorsSadao Kanbe, Shunichi Seki, Hitoshi Fukushima, Hiroshi Kiguchi
Life of this patent
Estimating the term…
Abstract
The present invention is a substrate for forming a patterned thin film by causing a specific fluid to adhere. More particularly, this substrate comprises a pattern formation region that is patterned in a specific shape in order to form a film. This pattern formation region is constituted such that an affinity region having an affinity to the fluid is disposed according to specific rules within a non-affinity region not having an affinity to the fluid. The fluid can be uniformly made to adhere to the required region, without spreading out too much or splitting up, allowing a uniform thin film to be formed.
Claims18
A method for manufacturing a substrate for forming a patterned thin film by applying a fluid, comprising the steps of:
- forming a paraffin layer by applying a paraffin coating to a base that exhibits an affinity to the fluid;
- and
- removing said paraffin layer by supplying energy to a region to be an affinity region having an affinity to said fluid such that said affinity region and a non-affinity region not having an affinity to said fluid are formed in a pattern formation region in which said patterned thin film is formed.
A method for manufacturing a substrate for forming a patterned thin film by applying a fluid, comprising the steps of:
- forming a paraffin layer by applying a paraffin coating to a base that exhibits no affinity to the fluid;
- removing said paraffin layer by supplying energy to a region to be a non-affinity region not having an affinity to said fluid such that an affinity region having an affinity to said fluid and said non-affinity region are formed in a pattern formation region in which said patterned thin film is formed;
- and
- removing said paraffin layer by supplying energy to a region to be a pattern non-formation region in which a patterned thin film is not formed.
A method for manufacturing a substrate for forming a patterned thin film by applying a fluid, comprising the steps of:
- forming a metal layer on a base that exhibits an affinity to the fluid;
- removing said metal layer by supplying energy to a region to be an affinity region having an affinity to said fluid such that said affinity region and a non-affinity region not having an affinity to said fluid are formed in a pattern formation region in which said patterned thin film is formed;
- and
- immersing said base from which the metal has been selectively removed in a mixed liquid containing a sulfur compound.
A method for manufacturing a substrate for forming a patterned thin film by applying a fluid, comprising the steps of
- forming a metal layer on a base that exhibits no affinity to the fluid;
- removing said metal layer by supplying energy to the region other than the pattern formation region in which said patterned thin film is formed;
- removing said metal layer by supplying energy to a region to be a non-affinity region not having an affinity to said fluid such that an affinity region having an affinity to said fluid and said non-affinity region are formed in said pattern formation region;
- and
- immersing said base from which the metal has been selectively removed in a mixed liquid containing a sulfur compound.
A method for manufacturing a substrate for forming a patterned thin film by applying a fluid, comprising the steps of:
- masking a base that exhibits no affinity to the fluid with a mesh mask that covers the region other than a pattern formation region in which said patterned thin film is formed and also covers a non-affinity region not having an affinity to said fluid such that an affinity region having an affinity to said fluid and said non-affinity region are formed in said pattern formation region;
- plasma-working said base covered with the mesh mask;
- and
- performing a modification treatment on the base surface that has been excited by said plasma working.
A method for manufacturing a substrate for forming a patterned thin film by applying a fluid, comprising the steps of:
- masking a base that exhibits an affinity to the fluid with a mesh mask that covers an affinity region having an affinity to said fluid such that said affinity region and a non-affinity region not having an affinity to said fluid are formed in a pattern formation region in which said patterned thin film is formed;
- plasma-working said base covered with the mesh mask;
- and
- performing a modification treatment on the base surface that has been excited by said plasma working.
A method for manufacturing a substrate for forming a patterned thin film by applying a fluid, comprising the steps of:
- masking a base that exhibits no affinity to the fluid with a mesh mask that covers the region other than a pattern formation region in which said patterned thin film is formed and also covers a non-affinity region not having an affinity to said fluid such that an affinity region having an affinity to said fluid is formed within said non-affinity region in said pattern formation region;
- and
- performing a modification treatment on said mesh-masked base by irradiating it with ultraviolet rays.
A method for manufacturing a substrate for forming a patterned thin film by applying a fluid, comprising the steps of:
- masking a base that exhibits an affinity to the fluid with a mesh mask that covers an affinity region having an affinity to said fluid such that said affinity region and a non-affinity region not having an affinity to said fluid are formed in a pattern formation region in which said patterned thin film is formed;
- and
- performing a modification treatment on said mesh-masked base by irradiating it with ultraviolet rays.
A method for manufacturing a substrate for forming a patterned thin film by applying a fluid, comprising the steps of:
- forming a thin film from a thin film material having an affinity to said fluid on a base furnished with a surface not having an affinity to the fluid;
- providing a photoresist such that an affinity region having an affinity to said fluid and a non-affinity region not having an affinity to said fluid are formed in a pattern formation region in which said patterned thin film is formed;
- and
- etching the base on which said photoresist has been formed and etching the region other than the region where said photoresist is provided.
A method for manufacturing a substrate for forming a patterned thin film by applying a fluid, comprising the steps of:
- forming a thin film from a thin film material not having an affinity to said fluid on a base furnished with a surface having an affinity to the fluid;
- providing a photoresist that covers the region other than a pattern formation region for forming said patterned thin film and also covers a non-affinity region not having an affinity to said fluid such that an affinity region having an affinity to said fluid and said non-affinity region are formed in said pattern formation region;
- and
- etching the base on which said photoresist has been formed and etching the region other than the region where said photoresist is provided.
A method for manufacturing a substrate for forming a patterned thin film by applying a fluid, comprising the steps of:
- applying a charge to the entire surface of a base that exhibits no affinity to the fluid;
- dissipating the charge by applying energy to the region other than a pattern formation region in which said patterned thin film is formed;
- dissipating the charge of a non-affinity region not having an affinity to said fluid such that an affinity region having an affinity to said fluid and said non-affinity region are formed in said pattern formation region;
- and
- bonding a specific substance to the affinity region where the charge was not dissipated.
A method for manufacturing a substrate for forming a patterned thin film by applying a fluid, comprising the steps of:
- applying a charge to the entire surface of a base that exhibits an affinity to the fluid;
- dissipating the charge of an affinity region having an affinity to said fluid such that said affinity region and a non-affinity region not having an affinity to said fluid are formed in a pattern formation region in which said patterned thin film is formed;
- and
- bonding a substance to the affinity region where the charge was not dissipated.
A method for manufacturing a substrate for forming a patterned thin film by applying a fluid, comprising the step of:
- printing an affinity film in an affinity region having an affinity to said fluid such that said affinity region and a non-affinity region not having an affinity to said fluid are formed in a pattern formation region in which said patterned thin film is formed on a base that exhibits no affinity to the fluid.
A method for manufacturing a substrate for forming a patterned thin film by applying a fluid, comprising the step of:
- printing a non-affinity film in the region other than a pattern formation region in which said patterned thin film is formed and in a disposed affinity region having an affinity to said fluid such that said affinity region and a non-affinity region not having an affinity to said fluid are formed in said pattern formation region on a base that exhibits an affinity to the fluid.
A method of manufacturing a substrate, comprising:
- forming a pattern formation region including a plurality of affinity regions, each having an affinity to a fluid and at least one non-affinity region not having an affinity to said fluid on a base;
- wherein said affinity region and said non-affinity region are formed such that the fluid is applied continuously to said affinity region and said non-affinity region between at least two of said affinity regions.
A method of pattern formation whereby a pattern is formed on a substrate, comprising the steps of:
- driving an ink-jet type recording head which is able to discharge liquid droplets of said fluid in accordance with a optional pattern, and
- forming a pattern with said fluid on said substrate by discharging liquid droplets of said fluid from the nozzles of said ink-jet recording head which is moving along said pattern,
- wherein the substrate comprises at least one pattern formation region having a shape corresponding to the patterned film, and said pattern formation region being constituted by an affinity region having an affinity to the fluid and a non-affinity region not having an affinity to the fluid.
Dependencies are inferred from the claim text.