Micro-casted silicon carbide nano-imprinting stamp

A method of micro-casting a silicon carbide nano-imprinting stamp, comprising:

• forming a release layer on a substrate layer;
• forming a mold layer on the release layer;
• patterning and then etching the mold layer to form a plurality of nano-sized mold cavities therein that extend to the release layer;
• forming a plurality of nano-sized features and a foundation layer connected therewith by filling in the nano-sized mold cavities with a material comprising silicon carbide;
• planarizing the foundation layer to form a substantially planar surface;
• forming a glue layer on the planar surface of the foundation layer;
• bonding a handling substrate with the glue layer by applying pressure and heat to the handling substrate and the substrate layer until the glue layer forms a mechanical bond with the foundation layer and the handling substrate;
• patterning and then etching a backside of the substrate layer to form a plurality of through holes that extend to the release layer;
• removing the substrate layer by introducing an etchant into the through holes so that the release layer is etched away thereby releasing the substrate layer;
• and
• etching the mold layer to remove the mold layer from the nano-sized features and the foundation layer.

A method of micro-casting a silicon carbide nano-imprinting stamp, comprising:

• forming a mold layer on a substrate layer;
• patterning and then etching the mold layer to form a plurality of nano-sized mold cavities therein that extend to the substrate layer;
• forming a plurality of nano-sized features and a foundation layer connected therewith by filling in the nano-sized mold cavities with a material comprising silicon carbide;
• planarizing the foundation layer to form a substantially planar surface;
• forming a glue layer on the planar surface of the foundation layer;
• bonding a handling substrate with the glue layer by applying pressure and heat to the handling substrate and the substrate layer until the glue layer forms a mechanical bond with the foundation layer and the handling substrate;
• removing the substrate layer from the mold layer;
• and
• etching the mold layer to remove the mold layer from the nano-sized features and the foundation layer.

A method of micro-casting a silicon carbide nano-imprinting stamp, comprising:

• patterning and then etching a mold layer to form a plurality of nano-sized mold cavities therein;
• forming a plurality of nano-sized features and a foundation layer connected therewith by filling in the nano-sized mold cavities with a material comprising silicon carbide;
• planarizing the foundation layer to form a substantially planar surface;
• forming a glue layer on the planar surface of the foundation layer;
• bonding a handling substrate with the glue layer by applying pressure and heat to the handling substrate and the mold layer until the glue layer forms a mechanical bond with the foundation layer and the handling substrate;
• and
• removing the mold layer from the foundation layer.