Plasma processing equipment and plasma processing method
OwnerTakaaki Matsuoka, Satoru Kawakami +1inventors
InventorsTakaaki Matsuoka, Satoru Kawakami, Katsuhiko Iwabuchi
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Abstract
A plasma processing apparatus, comprising: at least, a processing chamber for plasma-processing an object to be processed; gas supply means for supplying a gas into the processing chamber; and high-frequency supplying means for forming the gas into a plasma state. The gas supply means has at least one gas introduction pipe, and the tip of the gas introduction pipe is placed in a position in the processing chamber, which is capable of preferred control of the gas dissociation. There are provided a plasma processing apparatus and a plasma processing method which can improve the uniformity in the gas which has been supplied into the processing chamber.
Claims15
A plasma processing apparatus, comprising:
- at least,
- a processing chamber for plasma-processing an object to be processed;
- gas supply means for supplying a gas into the processing chamber;
- and
- high-frequency supplying means for forming the gas into a plasma state;
- wherein the gas supply means has at least one gas introduction pipe, the tip of the gas introduction pipe is placed in a position so that the tip is projected from the inner wall of the processing chamber facing the object to be processed, toward the interior of the processing chamber.
A plasma processing method, wherein an object to be processed which is placed in a processing chamber is subjected to plasma processing by utilizing plasma based on a gas which has been supplied into the processing chamber;
- the gas being supplied into the processing chamber from a gas introduction pipe;
- the tip of the gas introduction pipe being projected from the inner wall of the processing chamber facing the object to be processed, toward the interior of the processing chamber.
Dependencies are inferred from the claim text.