Substrate table, production method therefor and plasma treating device
AssigneeTokyo Electron Limited
InventorsShinji Muto, Chihiro Taguchi, Nobuyuki Okayama
Life of this patent
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Abstract
The susceptor (10) of a plasma treating device, or the electrostatic chuck (12) of a substrate table is formed by ceramic thermal spray method. A ceramic spray layer (12A) is pore-sealed by methacrylic resin (12D). Resin raw material mainly containing methyl methacrylate is applied to and impregnated into the ceramic spray layer and then is cured to thereby fill pores between ceramic particles in the ceramic spray layer with methacrylic resin. Methacrylic resin raw material solution, which does not produce pores at curing, can complete perfect pore sealing.
Claims16
A substrate table comprising:
- a table main body;
- and
- an electrostatic chuck layer arranged on the table main body, including an upper ceramic layer on which an object to be processed is mounted, a lower ceramic layer and an electrode layer disposed between the upper ceramic layer and the lower ceramic layer,
- wherein the upper ceramic layer is formed by thermal spraying and pore-sealed by a methacrylic resin.
A method for manufacturing a substrate table, comprising the steps of:
- preparing a table main body;
- forming on the table main body an electrostatic chuck layer made of a ceramic layer incorporating therein an electrode layer, the step of forming the electrostatic chuck layer including the step of forming the ceramic layer by thermally spraying a ceramic material while the table main body is heated.
Dependencies are inferred from the claim text.