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AssigneeFraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.
InventorsManfred Neumann, Steffen Straach, Mario Krug, Nicolas Schiller
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The invention relates to a device for the plasma activated vapor coating of large-surface moved substrates, comprising at least one vacuum recipient, one pump system, one evaporator, one device for holding and transporting the substrates to be coated and at least one arc discharge plasma source, whereby at least one device for generating a magnetic field is included, which device can generate a magnetic field between the evaporator and the substrate, the field lines of which magnetic field are aligned approximately perpendicular to the movement direction and parallel to the transport plane of the substrate, and at least one arc discharge plasma source is arranged such that the axis of the arc discharge plasma source is aligned approximately perpendicular to the field lines of the magnetic field.
Device for the plasma-activated vapor coating of large-surface moved substrates, at least containing one vacuum recipient, a pump system, an evaporator, a device for holding and transporting the substrates to be coated and at least one arc discharge plasma source, characterized in that at least one device generating magnetic fields is included, which device can generate a magnetic field in the vapor deposition zone between the evaporator and the substrate, the field lines of which magnetic field are aligned approximately perpendicular to the movement direction and parallel to the transport plane of the substrate, and at least one arc discharge plasma source is arranged such that the axis of the arc discharge plasma source is aligned approximately perpendicular to the field lines of the magnetic field.
Dependencies are inferred from the claim text.