Plasma processing apparatus having protection members
OwnerFumikane Honjou, Kazunori Hasegawa +1inventors
InventorsFumikane Honjou, Kazunori Hasegawa, Hiroki Okunishi
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Abstract
Disclosed is a plasma processing apparatus provided with a plasma chamber in which a plasma is generated by electron cyclotron resonance, and a sample chamber for housing a sample to be processed with the plasma. The plasma chamber is provided with a protection tube for protecting the inner walls of the plasma chamber from deposition of products resulting from the plasma processing. The protection tube is composed of a plurality of sub-tubes formed in relation to the temperature distribution at the time of the plasma processing.
Claims21
A plasma processing apparatus comprising:
- a plasma chamber in which a high-density plasma is generated;
- a sample chamber in communication with the plasma chamber for housing a sample to be processed using the plasma;
- and
- a protection tube for protecting an inner wall of the plasma chamber from deposition of a product that results from the plasma processing, wherein
- the protection tube is composed of a plurality of pieces formed in relation to a distribution of temperatures in the plasma chamber at a time of the plasma processing.
A plasma processing apparatus comprising:
- a plasma chamber in which a high-density plasma is generated;
- a sample chamber in communication with the plasma chamber for housing a sample to be processed using the plasma;
- and
- a protection tube for protecting an inner wall of the sample chamber from deposition of a product that results from the plasma processing, wherein
- the protection tube is composed of a plurality of pieces formed in relation to a distribution of temperatures in the sample chamber at the time of the plasma processing.
Dependencies are inferred from the claim text.