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US 2004/0168586 A1Published application
Imprint lithography template having a feature size under 250 nm
AssigneeBoard of Regents, The University of Texas System
InventorsTodd Bailey, Byung J. Choi, Matthew Colburn, S.V. Sreenivasan, C. Grant Willson, John Ekerdt
Life of this patent
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Abstract
The present invention includes a template comprising a plurality of protrusions and a plurality of recessions with a distance between a zenith of any of the plurality of protrusions and a nadir of any one of the plurality of recessions being less than 250 nm.
Claims20
A template comprising:
- a mold having a plurality of protrusions and a plurality of recessions with a distance between a zenith of any of said plurality of protrusions and a nadir of any of said plurality of recessions being less than 250 nm.
A template comprising:
- a mold having a relief structure on a first surface thereof, with said relief structure having a planarity less than 250 nm.
A template comprising:
- a body having a first surface disposed opposite a second surface;
- and
- a plurality of protrusions and a plurality of recessions, disposed on said first surface, with a distance between a zenith of any of said plurality of protrusions and a nadir of any of said plurality of recessions being less than 250 nm.
Dependencies are inferred from the claim text.