System and method for monitoring contamination
AssigneeExtraction Systems, Inc.
InventorsOleg P. Kishkovich, Anatoly Grayfer, William M. Goodwin, Devon Kinkead
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Abstract
The present invention provides passive sampling systems and methods for monitoring contaminants in a semiconductor processing system. In one embodiment, that passive sampling system comprises a collection device in fluid communication with a sample line that provides a flow of gas from a semiconductor processing system. The collection device is configured to sample by diffusion one or more contaminants in the flow of gas.
Claims24
A system for determining and monitoring contamination in a photolithography instrument, comprising at least one collection device in fluid communication with a gas flow extending through an optical system of the tool, the collection device having an adsorptive material and a saturation capacity, the collection device being operated past the saturation capacity to adsorb contaminants in the gas flow.
A contamination analysis apparatus in a photolithography system having an optical element comprising:
- a collection device comprising a material having a surface property of the optical element coupled to a gas source, the collection device being coupled to a light source and having an adsorptive material and operated past a saturation capacity to adsorb contaminants.
A method for removing contaminants in a semiconductor processing system, comprising the steps of:
- delivering a gas stream from the semiconductor processing system to a collection device, the processing system having an optical system;
- and
- collecting contaminants from the gas stream in the collection device for a duration exceeding a saturation capacity of the collection device.
A method for monitoring and removing of contaminants in a photolithography system having an optical path, comprising the steps of:
- delivering a gas stream from a photolithography system to a collection device;
- detecting contaminants from the gas stream with the collection device;
- analyzing contaminants;
- and
- actuating a membrane to remove contaminants from the optical path.
A filtering system for removing contamination in a semiconductor processing system, comprising at least one collection device in fluid communication with a gas flow extending through an optical system of the semiconductor processing system, at least one collection device having a selectively permeable membrane that filters contaminants such as at least one of a refractory compound, a high molecular weight compound and a low molecular weight compound from the gas flow.
A method for cleaning a contaminated surface in a semiconductor processing system, comprising the steps of. delivering a gas stream to the contaminated surface in the processing system in the presence of light, the gas stream having an additive gas and the gas stream combining with a contaminant on the contaminated surface to form a volatile product;
- and
- removing the volatile product from the processing system.
Dependencies are inferred from the claim text.