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US 2004/0166652 A1Published application
Mask and method of manufacturing the same, electro-luminescence device and method of manufacturing the same, and electronic instrument
AssigneeSeiko Epson Corporation
InventorShinichi Yotsuya
Life of this patent
Estimating the term…
Abstract
A method of manufacturing a mask includes: attaching a second substrate having a plurality of penetrating holes to a first substrate having an opening. The second substrate is attached such that the penetrating holes are positioned within the opening. A groove is formed on a surface of the first substrate facing the second substrate. The groove is utilized to form a flow path between the first and second substrates.
Claims42
A method of manufacturing a mask comprising:
- attaching to a first substrate having an opening a second substrate having a plurality of penetrating holes such that the penetrating holes are positioned within the opening, the penetrating holes set to be perpendicular to a surface of the second substrate;
- forming a groove on at least one of a surface of the first substrate facing the second substrate and a surface of the second substrate facing the first substrate;
- and
- utilizing the groove to form a flow path between the first and second substrates.
1 more element
A mask comprising:
- a first substrate having an opening;
- and
- a second substrate attached to the first substrate and having a plurality of penetrating holes, the penetrating holes set to be perpendicular to a surface of the second substrate, wherein:
- the second substrate is attached to the first substrate such that the penetrating holes are positioned within the opening;
- a groove is formed on at least one of a surface of the first substrate facing the second substrate and a surface of the second substrate facing the first substrate;
- and
- the groove is utilized to form a flow path between the first and second substrates.
4 more elements
A method of manufacturing a mask comprising:
- attaching to a first substrate having an opening a second substrate having a plurality of penetrating holes such that the penetrating holes are positioned within the opening, the penetrating holes set to be tapered;
- forming a groove on at least one of a surface of the first substrate facing the second substrate and a surface of the second substrate facing the first substrate;
- and
- utilizing the groove to form a flow path between the first and second substrates.
1 more element
A mask comprising:
- a first substrate having an opening;
- and
- a second substrate attached to the first substrate and having a plurality of penetrating holes, the penetrating holes set to be tapered, wherein:
- the second substrate is attached to the first substrate such that the penetrating holes are positioned within the opening;
- a groove is formed on at least one of a surface of the first substrate facing the second substrate and a surface of the second substrate facing the first substrate;
- and
- the groove is utilized to form a flow path between the first and second substrates.
4 more elements
Dependencies are inferred from the claim text.