Method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers and monomers used for making such polymers
AssigneesPromerus, LLC, International Business Machines Corporation
InventorsLarry F. Rhodes, Chun Chang, Leah J. Langsdorf, Howard A. Sidaway, Hiroshi Ito
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Abstract
A photoresist composition encompassing a polymer having at least one polycyclic olefin repeat unit having a desired exo mole percent is provided, where the repeat unit is derived from a polycyclic olefin monomer having the desired exo mole percent. Such polymers having such repeat units having a desired exo mole percent offer control of differential dissolution rate and hence provide enhanced imaging properties. Exemplary monomers having a desired exo mole percent are also provided
Claims3
A photoresist composition comprising a polymer comprising at least one polycyclic olefin derived type of repeat unit having a desired exo mole percent.
A method of improving the imaging capability of a photoresist composition, comprising providing a polymeric resin comprising polycyclic olefin derived repeat units having a desired exo mole percent.
A method of controlling the differential dissolution rate of a photoresist composition comprising providing a polymeric resin to the photoresist composition comprising polycyclic olefin derived repeat units having a desired exo mole percent.
Dependencies are inferred from the claim text.