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US 2004/0166421 A1Published application
Photomask for near-field exposure, near-field exposure method, and near-field exposure apparatus
AssigneeCanon Kabushiki Kaisha
InventorsTakako Yamaguchi, Ryo Kuroda
Life of this patent
Estimating the term…
Abstract
Disclosed is a photomask for near-field exposure, including: a substrate; and a membrane portion supported by the substrate and having on one side thereof a shielding membrane that has a micro aperture, in which the photomask has such a structure as to relieve stress that is generated in the border between the membrane portion and the substrate when the membrane portion is sagged.
Claims20
A photomask for near-field exposure, comprising:
- a substrate;
- and
- a membrane portion supported by the substrate and having on one side of the membrane portion a shielding membrane that has a micro aperture,
- wherein the photomask has such a structure as to relieve stress that is generated at a border between the membrane portion and the substrate when the membrane portion is sagged.
1 more element
A near-field exposure method for exposing an object to be exposed to light, comprising the steps of:
- fitting a shielding membrane of a photomask for near-field exposure to the object;
- and
- irradiating the object with light from a light source through the shielding membrane, the photomask being composed of a substrate and a membrane portion that is supported by the substrate and has on one side of the membrane portion the shielding membrane, the shielding membrane having a micro aperture,
- wherein the photomask has a structure for relieving stress that is generated in the border between the membrane portion and the substrate when the membrane portion is sagged.
1 more element
A near-field exposure apparatus comprising:
- a light source;
- a stage on which an object to be exposed to light is placed;
- and
- a photomask composed of a substrate and a membrane portion, the membrane portion being supported by the substrate and having on one side of the membrane portion a shielding membrane that has a micro aperture,
- wherein the shielding membrane is brought into close contact with the object placed on the stage so that the object is irradiated with light from the light source through the shielding membrane for exposure, and
- wherein the photomask has a structure for relieving stress that is generated in the border between the membrane portion and the substrate when the membrane portion is sagged.
3 more elements
Dependencies are inferred from the claim text.