Vapor-deposited film
AssigneeToppan Printing Co., Ltd.
InventorsHiroshi Suzuki, Takeshi Kanetaka, Miki Oohashi, Noboru Sasaki, Takayuki Nakajima, Ryoji Ishii
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Abstract
A vapor-deposited film having a substrate consisting essentially of a polymer material and a vapor-deposited layer consisting essentially of a ceramic, the substrate being subjected to plasma pre-treatment using a hollow anode plasma treatment device, prior to vapor deposition of the vapor-deposited layer.
Claims25
A vapor-deposited film comprising a substrate consisting essentially of a polymer material and a vapor deposition layer formed on the substrate and consisting essentially of a ceramic material,
- wherein the substrate is subjected to a plasma pretreatment before formation of the vapor deposition layer on the substrate, by a special plasma using a hollow anode plasma processing apparatus.
A vapor-deposited film comprising a substrate consisting essentially of a polymer material and a vapor deposition layer formed on the substrate consisting essentially of aluminum oxide,
- wherein the substrate is subjected to a plasma pretreatment before formation of the vapor deposition layer on the substrate and that the aluminum oxide layer formed by the vapor deposition has a gradient structure in terms of an atomic ratio of aluminum to oxygen from the side in contact with the substrate toward the surface of the aluminum oxide layer.
Dependencies are inferred from the claim text.