Barrier-forming film and manufacturing method thereof
AssigneeDai Nippon Printing Co., Ltd.
InventorsKoujiro Ohkawa, Atsuo Tsuzuki, Kuniaki Yoshikata
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Abstract
The present invention provides a barrier-forming film (A) useful for manufacturing various packaging container, which has a higher barrier-formability to prevent permeation of oxygen gas or steam, and a manufacturing method thereof. The barrier-forming film of the invention comprises a substrate film (1) having a vapor-deposited film (2) of an inorganic oxide, and by applying an annealing treatment thereto to limit the steam permeability within a range of from 2.0 to 0.000001 g/m2.day, and the oxygen permeability, within a range of from 2.0 to 0.000001 cc/m2.day.
Claims7
A manufacturing method of a barrier-forming film comprising the steps of providing a vapor-deposited inorganic oxides film on a side of a substrate film, and applying an annealing treatment to the substrate film having said vapor-deposited inorganic film.
A manufacturing method of a barrier-forming film comprising the steps of providing a vapor-deposited inorganic oxides film on a side of a substrate film, and applying an annealing treatment to the substrate film having said vapor-deposited inorganic film, to cause thermal shrinkage of the substrate film composing the substrate film having the vapor-deposited inorganic oxide film, and to increase density of the vapor-deposited inorganic oxide film.
A manufacturing method of a barrier-forming film, comprising the steps of providing a vapor-deposited silicon oxide film on one side of a substrate film, and heat-treating the substrate film having said vapor-deposited silicon oxide film at a heat treatment temperature of at least room temperature for a heat treatment time of at least one hour.
Dependencies are inferred from the claim text.