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US 2004/0166016 A1Published application
High-purity metal
AssigneeDowa Mining Co., Ltd.
InventorsKishio Tayama, Shunichi Kimura
Life of this patent
Estimating the term…
Abstract
A high-purity metal (such as magnesium or zinc) containing Cl, F and S in a respective amount of no more than 0.1 ppm, with the total impurity content being no more than 1 ppm.
Claims5
A high-purity metal containing Cl, F and S in a respective amount of no more than 0.1 ppm, with the total impurity content being no more than 1 ppm.
Dependencies are inferred from the claim text.