Method of fabricating active layers in a laser utilizing InP-based active regions
AssigneeAgilent Technologies, Inc.
InventorsAshish Tandon, Ying-Lan Chang
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AssigneeAgilent Technologies, Inc.
InventorsAshish Tandon, Ying-Lan Chang
Estimating the term…
A laser and method for making the same are disclosed. The laser includes a p-layer, an n-layer, and an active region located between the p-layer and the n-layer. The active region includes a quantum well layer sandwiched between first and second barrier layers. The quantum well layer includes an InP-based material. The first and second barrier layers also include an InP-based material. The barrier layers are homogeneous layers of the InP-based material. The barrier layers are preferably deposited by chemical vapor deposition from precursors that include a surfactant element that inhibits the formation of P-P dimers on a surface of the barrier layer during the deposition process. In one embodiment, the surfactant element is chosen from the group consisting of Sb, Si, and Te, and the barrier material includes InGaP or AlInP.
A laser comprising:
In a method for fabricating a laser having a p-layer, an n-layer, and an active region between said p-layer and said n-layer, said active region comprising a quantum well layer sandwiched between first and second barrier layers, said quantum well layer comprising an InP-based material and said first and second barrier layers comprising an InP-based material, the improvement comprises depositing said barrier layers by chemical vapor deposition from precursors comprising a surfactant element that inhibits the formation of P-P dimers on a surface of said barrier layer during said deposition process.
Dependencies are inferred from the claim text.