Retainer, exposure apparatus, and device fabrication method
AssigneeCanon Kabushiki Kaisha
InventorNaoki Murasato
Life of this patent
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Abstract
A retainer for holding an optical element includes a detector for detecting a deformation amount of the optical element, and an adjustment unit for adjusting the deformation of the optical element based on the deformation amount.
Claims25
A retainer for holding an optical element, said retainer comprising:
- a detector for detecting a deformation amount of the optical element;
- and
- an adjustment unit for adjusting the deformation of the optical element based on the deformation amount.
A retainer for holding an optical element, said retainer comprising:
- an adjustment unit for adjusting a shape of the optical element, said adjustment unit including a component;
- and
- a detector for detecting a deformation amount of the component in said adjustment unit, said adjustment unit adjusting the shape of the optical element based on a detection result by said detector.
An adjustment method for adjusting a shape of the optical element into a desired shape, said method comprising the steps of:
- obtaining the shape of the optical element;
- calculating a force to be applied to the optical element to correct the shape of the optical element into the desired shape;
- and
- applying the force calculated by said calculating step to the optical element.
An exposure apparatus comprising:
- a retainer for holding an optical element, said retainer including a detector for detecting a deformation amount in a shape of the optical element, and an adjustment unit for adjusting the shape of the optical element based on the deformation amount;
- and
- an optical system for exposing a pattern formed on a mask or reticle onto an object through the optical element held by the retainer.
An exposure apparatus comprising:
- a retainer for holding an optical element, said retainer including an adjustment unit for adjusting a shape of the optical element, said adjustment unit including a component, and a detector for detecting a deformation amount of the component in said adjustment unit, the adjustment unit adjusting the shape of the optical element based on a detection result by said detector;
- and
- an optical system for exposing a pattern formed on a mask or reticle onto an object through the optical element held by the retainer.
A device fabrication method comprising the steps of:
- exposing a pattern on a mask, onto an object by using an exposure apparatus that includes a retainer that includes three support parts for supporting an optical element, a first unit for applying a first elastic force to the optical element in an anti-gravity direction, and a second unit, arranged opposite to the first unit through the optical element, for applying a second elastic force to the optical element in a gravity direction, and an optical system for exposing a pattern formed on a mask or reticle onto an object through the optical element held by the retainer;
- and
- developing the object that has been exposed.
A device fabrication method comprising the steps of:
- exposing a pattern on a mask, onto an object by using an exposure apparatus that includes a retainer for holding an optical element, said retainer including an adjustment unit for adjusting a shape of the optical element, said adjustment unit including a component, and a detector for detecting a deformation amount of the component in said adjustment unit, the adjustment unit adjusting the shape of the optical element based on a detection result by said detector, and an optical system for exposing a pattern formed on a mask or reticle onto an object through the optical element held by the retainer;
- and
- developing the object that has been exposed.
Dependencies are inferred from the claim text.