Method, structure, and apparatus for Raman spectroscopy
AssigneeIntel Corporation
InventorsTae-Woong T. Koo, Mineo Yamakawa
Life of this patent
Estimating the term…
Abstract
Disclosed herein are a Raman spectroscopy structure comprising a porous material substrate, and a method of performing Raman spectroscopy of a sample disposed adjacent to the structure comprising the porous material substrate. Generally, the substrate includes one or more layers of a porous material such as porous silicon, porous polysilicon, porous ceramics, porous silica, porous alumina, porous silicon-germanium, porous germanium, porous gallium arsenide, porous gallium phosphide, porous zinc oxide, and porous silicon carbide. It has been discovered that such a substrate material, when excited with near-infrared light, does not exhibit undesired background fluorescence characteristic of other known Raman spectroscopy substrates.
Claims40
A Raman scattering structure comprising a substrate, the substrate comprising a porous material selected from the group consisting of porous silicon, porous polysilicon, porous ceramics, porous silica, porous alumina, porous silicon-germanium, porous germanium, porous gallium arsenide, porous gallium phosphide, porous zinc oxide, and porous silicon carbide.
A Raman spectroscopy apparatus comprising:
- (a) a light source;
- (b) a structure comprising a substrate, the substrate comprising a porous material selected from the group consisting of porous silicon, porous polysilicon, porous ceramics, porous silica, porous alumina, porous silicon-germanium, porous germanium, porous gallium arsenide, porous gallium phosphide, porous zinc oxide, and porous silicon carbide;
- (c) one or more lenses for directing light from the light source onto the substrate or for collecting Raman scattered light from the substrate and a sample;
- and,
- (d) a spectroscopic analyzer capable of producing an electronic signal proportional to an intensity of the Raman scattered light in a fixed wavelength range or as a function of wavelength.
A method of performing Raman spectroscopy, the method comprising:
- (a) positioning a sample adjacent to a structure comprising a substrate, the substrate comprising a porous material selected from the group consisting of porous silicon, porous polysilicon, porous ceramics, porous silica, porous alumina, porous silicon-germanium, porous germanium, porous gallium arsenide, porous gallium phosphide, porous zinc oxide, and porous silicon carbide;
- (b) directing light from a light source onto the substrate and the sample;
- and,
- (c) measuring an intensity of any Raman scattered light from the sample and the substrate.
Dependencies are inferred from the claim text.