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US 2004/0165159 A1Published application
Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsJoeri Lof, Joannes Theodoor De Smit, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Theodorus Marinus Modderman
Life of this patent
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Abstract
In an immersion lithography apparatus, a member surrounds a space between a projection system and a substrate table. A seal is formed to contain liquid in the space.
Claims47
A lithographic projection apparatus comprising:
- a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;
- a substrate table configured to hold a substrate;
- a projection system configured to project the patterned beam onto a target portion of the substrate;
- and
- a liquid supply system configured to at least partly fill a space between said projection system and said substrate, with a liquid through which said beam is to be projected, said liquid supply system comprising:
- a liquid confinement structure extending along at least a part of the boundary of said space, and
- a seal between said structure and the surface of said substrate.
4 more elements
An immersion lithographic projection apparatus, comprising:
- a support structure configured to hold a patterning device, the patterning device configured to pattern a beam according to a desired pattern;
- a substrate table configured to hold a substrate;
- a projection system configured to project the patterned beam onto a target portion of the substrate;
- and
- a liquid confinement structure extending along at least part of the boundary of a space bounded by the periphery of a localized area on the surface of said substrate and said surface of said substrate, said space configured to contain a liquid through which said beam is projected and said structure substantially sealing at least part of said space.
2 more elements
A device manufacturing method comprising:
- providing a liquid to fill a space between a substrate and a projection system, a liquid confinement structure extending along at least a part of the boundary of said space;
- forming a gas seal between said structure and the surface of said substrate;
- and
- projecting a patterned beam of radiation, through said liquid, onto a target portion of the substrate.
1 more element
An immersion lithographic projection apparatus comprising:
- a support structure configured to hold a patterning device and movable in a scanning direction, the patterning device configured to pattern a beam of radiation according to a desired pattern;
- a substrate table configured to hold a substrate and movable in a scanning direction;
- a projection system configured to project the patterned beam onto a target portion of the substrate using a scanning exposure;
- a liquid confinement structure that substantially seals at least part of a space bounded by a surface of said substrate and the boundary of a portion of said surface;
- and
- a liquid inlet to provide a liquid, through which said beam is projected, to said space.
3 more elements
A lithographic projection apparatus comprising:
- a support structure configured to hold a patterning device and movable in a scanning direction, the patterning device configured to pattern a beam of radiation according to a desired pattern;
- a substrate table configured to hold a substrate and movable in a scanning direction;
- a projection system configured to project the patterned beam onto a target portion of the substrate using a scanning exposure;
- a liquid confinement structure having an aperture having a cross-sectional area smaller than a surface area of said substrate;
- a seal between said structure and said substrate;
- and
- a liquid inlet to provide a liquid, through which said beam is projected, to said aperture.
4 more elements
An immersion lithographic projection apparatus comprising:
- a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;
- a substrate table configured to hold a substrate;
- a projection system configured to project the patterned beam onto a target portion of the substrate;
- a liquid confinement structure that can substantially confine all of a liquid provided to an area of a radiation-sensitive surface of said substrate under said projection system, said area being smaller than the entire area of said substrate surface;
- and
- a liquid inlet to provide a liquid to said area and between said projection system and said substrate surface.
3 more elements
Dependencies are inferred from the claim text.