High reflector tunable stress coating, such as for a MEMS mirror
AssigneeIntel Corporation
InventorMichael Goldstein
Life of this patent
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Abstract
An optical device having a high reflector tunable stress coating includes a micro-electromechanical system (MEMS) platform, a mirror disposed on the MEMS platform, and a multiple layer coating disposed on the mirror. The multiple layer coating includes a layer of silver (Ag), a layer of silicon dioxide (SiO2) deposited on the layer of Ag, a layer of intrinsic silicon (Si) deposited on the layer of SiO2, and a layer of silicon oxynitride (SiOxNy) deposited on the layer of Si. The concentration of nitrogen is increased and/or decreased to tune the stress (e.g., tensile, none, compressive).
Claims26
An apparatus, comprising:
- a base of a photonic device;
- a multiple layer coating disposed on the base, wherein the multiple layer coating includes a first layer of silver (Ag) having a physical thickness of at least approximately one hundred nanometers, a second layer of silicon dioxide (SiO2) having an optical thickness of a first percentage of a quarter of a wavelength of interest within a band of wavelengths of interest, a third layer of silicon (Si) having an optical thickness of a second percentage of a quarter of the wavelength, and a fourth layer of silicon oxynitride (SiOxNy) having an optical thickness of a third percentage of a quarter of the wavelength and a ratio of Ny in the fourth layer of SiOxNy includes values within a range from approximately sixty percent Ny to twenty percent Ny.
An apparatus, comprising:
- a base of a photonic device;
- a multiple layer reflective coating disposed on the base, wherein the multiple layer reflective coating includes a stress tunable from tensile to compressive and a shape tunable from convex to concave.
An apparatus, comprising:
- a base of a photonic device;
- a multiple layer coating disposed on the base, wherein the multiple layer coating includes a tunable index of refraction across a range of angles of incidence of interest and a reflectance greater than ninety-nine percent over the range of angles of incidence.
A system, comprising:
- a micro-electromechanical system (MEMS) platform;
- and
- a mirror coupled to the MEMS platform, wherein the mirror includes a multiple layer coating having a stress tunable from tensile to compressive and a shape tunable from convex to concave.
An apparatus, comprising:
- a base of a photonic device;
- a multiple layer coating disposed on the base, wherein the multiple layer coating includes a first layer of gold (Au) having a physical thickness of at least approximately one hundred nanometers, a second layer of dielectric material having an optical thickness of a first percentage of a quarter of a wavelength of interest within a band of wavelengths of interest, a third layer of silicon (Si) having an optical thickness of a second percentage of a quarter of the wavelength, and a fourth layer of silicon oxynitride (SiOxNy) having an optical thickness of a third percentage of a quarter of the wavelength and a ratio of Ny in the fourth layer of SiOxNy includes values within a range from approximately sixty percent Ny to twenty percent Ny.
Dependencies are inferred from the claim text.