Method and apparatus for manufacturing display panel

A method for manufacturing a display panel, comprising the steps of:

• mounting an insulating substrate on a stage, said insulating substrate having an amorphous silicon film or a poly-crystalline silicon film formed in a main surface of said insulating substrate, said amorphous or poly-crystalline silicon film including a central portion which should serve as a pixel region having pixel active devices to thereby array a large number of pixels in a matrix, and a portion which is outside said pixel region and which should serve as a peripheral circuit region including a drive circuit portion, having drive portion active devices and disposed in the circumference of said insulating substrate;
• and
• irradiating the whole surface of said amorphous or poly-crystalline silicon film on said insulating substrate with a solid-state pulsed laser beam, and then irradiating only said peripheral circuit region with a time-modulated solid-state continuous-wave laser beam, so as to apply laser annealing to said amorphous or poly-crystalline silicon film.

A method for manufacturing a display panel, comprising the steps of:

• mounting an insulating substrate on a stage, said insulating substrate having an amorphous silicon film or a poly-crystalline silicon film formed in a main surface of said insulating substrate, said amorphous or poly-crystalline silicon film including a central portion which should serve as a pixel region having pixel active devices to thereby array a large number of pixels in a matrix, and a portion which is outside said pixel region and which should serve as a peripheral circuit region including a drive circuit portion, having drive portion active devices and disposed in the circumference of said insulating substrate;
• and
• irradiating only said pixel region with a solid-state pulsed laser beam, and then irradiating only said peripheral circuit region with a time-modulated solid-state continuous-wave laser beam, so as to apply laser annealing to said amorphous or poly-crystalline silicon film.

A method for manufacturing a display panel, comprising the steps of:

• mounting an insulating substrate on a stage, said insulating substrate having an amorphous silicon film or a poly-crystalline silicon film formed in a main surface of said insulating substrate, said amorphous or poly-crystalline silicon film including a central portion which should serve as a pixel region having pixel active devices to thereby array a large number of pixels in a matrix, and a portion which is outside said pixel region and which should serve as a peripheral circuit region including a drive circuit portion, having drive portion active devices and disposed in the circumference of said insulating substrate;
• and
• irradiating only said periphery circuit region with a time-modulated solid-state continuous-wave laser beam, and then irradiating only a region where said pixel active devices are formed with a solid-state pulsed laser beam, so as to apply laser annealing to said amorphous or poly-crystalline silicon film.