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US 2004/0164281 A1Published application
Oxide sintered body and sputtering target, and manufacturing method for transparent conductive oxide film as electrode
AssigneeSumitomo Metal Mining Co., Ltd.
InventorsYoshiyuki Abe, Noriko Ishiyama, Go Ohara
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Abstract
An oxide sintered body for sputtering target is provided wherein the main component is indium oxide, and it contains titanium such that the atomic ratio of Ti/In is 0.003 to 0.120, and the specific resistance is 1 k.cm or less.
Claims14
An oxide sintered body essentially consisting of indium oxide and containing titanium, wherein the titanium is contained such that the atomic ratio Ti/In is in the range from 0.003 to 0.120, and wherein the specific resistance is 1 k.cm or less.
Dependencies are inferred from the claim text.