Modified blades for process chamber throttle valve
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsTa-Chin Lee, Kun-Yi Chen, Hue-Ming Kuo
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsTa-Chin Lee, Kun-Yi Chen, Hue-Ming Kuo
Estimating the term…
The valve blades of the present invention facilitate delayed onset and gradual or fine variations in the flow of gas through the throttle valve to achieve a process interval of interior chamber gas pressures over a broader valve blade step range, achieve aggressive PI over a broad range for enhanced tool throughput, enhance stability of interior chamber gas pressures during substrate processing, and increase tool uptime and production efficiency. In one embodiment, each of the two valve blades in the throttle valve includes at least one, and typically, multiple notches or gaps for a delayed onset, and finely-graded increase, in flow of gas through the valve throughout the step range of the valve blades. In another embodiment, the semicircular valve blades have a cam-shaped configuration and are capable of varying the radius of the circle defined by the two blades.
A throttle valve comprising:
A throttle valve comprising:
A throttle valve comprising:
Dependencies are inferred from the claim text.