Solid-state imaging device and method of manufacturing the same

A solid-state imaging device, comprising:

• a plurality of pixel cells that are laid out in matrix form on a semiconductor substrate;
• and
• a driving unit that is provided to drive the plurality of pixel cells,
• wherein each of the plurality of pixel cells includes:
• a photodiode that converts incident light into a signal charge and stores the signal charge;
• at least one MOS transistor that is provided to read out the signal charge stored in the photodiode;
• and
• an element isolating portion that is formed so that the photodiode and each of the at least one MOS transistor are isolated from each other, the element isolating portion being formed of a STI (Shallow Trench Isolation) that is a grooved portion of the semiconductor substrate, and
• in the semiconductor substrate, a STI leakage stopper in which an impurity of a conductive type opposite to a conductive type of source/drain regions in the at least one MOS transistor is introduced is formed to enclose side walls and a bottom face of the element isolating portion forming the grooved portion.