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US 2004/0163767 A1Published application
Plasma producing device
AssigneeShimadzu Corporation
InventorsMasahiro Ueda, Masayasu Suzuki
Life of this patent
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Abstract
A plasma source includes a plasma source cavity having a tubular shape for forming plasma, an exciting coil for forming a radio frequency magnetic field, and a magnetic path structure for guiding magnetic flux of the radio frequency magnetic field. The magnetic flux extends from an end surface of the plasma source cavity to a side surface of the plasma source cavity and from the side surface of the plasma source cavity to the end surface of the plasma source cavity.
Claims4
A plasma source, comprising:
- a plasma source cavity with a tubular shape for producing plasma having an end surface and a side surface,
- an exciting coil placed adjacent to the plasma source cavity for forming a radio frequency magnetic field, and
- a magnetic path structure placed outside the plasma source cavity for forming a path of magnetic flux of the radio frequency magnetic field extending from the end surface to the side surface and returning from the side surface to the end surface to thereby provide a uniform distribution of the radio frequency magnetic field in the plasma source cavity.
Dependencies are inferred from the claim text.