Inductively coupled RF plasma reactor and plasma chamber enclosure structure therefor

A plasma chamber dome for an RF plasma reactor which includes a pedestal adapted to support a workpiece to be processed, a reactor base housing the pedestal, and a coil antenna adjacent the reactor and which is adapted to inductively couple RF power into the reactor, said dome comprising:

• a) said dome having an inverted cup-shape configuration having top and side walls in a generally right circular cylindrical configuration;
• b) said top wall comprising:
• (i) a centrally located gas inlet;
• and
• (ii) a substantially flat interior surface extending to said gas inlet, said substantially flat interior surface of said top wall having at least a portion extending in a direction away from said centrally located gas inlet with an angle of declination toward the pedestal;
• c) said sidewall comprising:
• (i) a lower cylindrical portion generally transverse to the pedestal when positioned over the base;
• and
• (ii) a transitional portion between said lower cylindrical portion and said top wall, said transitional portion extend inwardly from said lower cylindrical portion, said transitional portion comprising at least one radius of curvature;
• d) said dome being adapted so as to be capable of having said top wall in a facing relationship to the pedestal when positioned over the base;
• e) said dome being adapted to define a plasma-processing volume over the pedestal;
• f) said dome being adapted to cover the reactor base to comprise the RF plasma reactor;
• g) said dome being capable of transmitting inductive power therethrough from an adjacent antenna;
• h) said top wall and said side wall being formed of a dielectric material selected from a group consisting of silicon, silicon carbide, quartz, alumina, and sapphire;
• and
• i) said substantially flat interior surface being a substantial portion of said interior surface of said top wall.

An RF plasma reactor which includes a pedestal adapted to support a workpiece to be processed, a reactor base housing the pedestal, and a coil antenna adjacent the reactor and which is adapted to inductively couple RF power into the reactor, the reactor comprising:

• a) a single-wall dielectric enclosure structure of an inverted cup-shaped configuration having a ceiling comprising a centrally located gas inlet and comprising an interior surface comprising a conical profile extending to said gas inlet;
• b) said single-wall dielectric enclosure structure having a side wall comprising a cylindrical portion generally transverse to the pedestal when positioned over the base and comprising a transition portion extending inward from said cylindrical portion, said transition portion comprising at least one radius of curvature;
• c) said single-wall dielectric enclosure structure being adapted to cover the reactor base to comprise the RF plasma reactor;
• d) said single-wall dielectric enclosure structure being adapted to define a plasma-processing volume over the pedestal;
• e) said single-wall dielectric enclosure structure being capable of transmitting inductive power therethrough from an adjacent antenna;
• f) said single-wall dielectric enclosure structure being formed of a dielectric material selected from a group consisting of silicon, silicon carbide, quartz, and alumina;
• and
• g) said ceiling of said conical profile being a substantial portion of said ceiling.