Patterning solution deposited thin films with self-assembled monolayers
AssigneeInternational Business Machines Corporation
InventorsCherie R. Kagan, Tricia B. Carmichael, Laura L. Kosbar
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Abstract
The present invention provides a method of forming a patterned thin film on a surface of a substrate having thereon a patterned underlayer of a self-assembled monolayer. The method comprises depositing a thin film material on the self-assembled monolayer to produce a patterned thin film on the surface of the substrate. The present invention further provides processes for preparing the self-assembled monolayer. The present invention still further provides solution-based deposition processes, such as spin-coating and immersion-coating, to deposit a thin film material on the self-assembled monolayer to produce a patterned thin film on the surface of the substrate.
Claims29
A method of forming a patterned thin film, wherein said thin film is not a monolayer, said process comprising the step of:
- depositing a thin film material on a surface of a substrate having thereon a patterned underlayer of a self-assembled monolayer.
Dependencies are inferred from the claim text.