Plasma processing apparatus

A plasma processing apparatus of processing a specimen placed on a table disposed inside of a processing chamber by using plasmas formed in the processing chamber,

• the apparatus comprising:
• temperature control means disposed inside of the table for controlling the temperature of the outer circumferential zone and the central zone of the table to a first temperature and a second temperature respectively;
• and
• pressure control means for controlling the pressure of a heat conducting gas supplied between the surface of the table and the specimen in contact with the surface to the outer circumferential zone and the inner circumferential zone of the specimen to a first pressure and a second pressure, respectively.

A plasma processing apparatus of processing a specimen placed on a table disposed inside of a processing chamber and having plural layers on the surface thereof by using plasmas formed in the processing chamber, in which

• the table is disposed to an upper portion thereof and comprises thereon a first member in contact with the specimen and a second member disposed below the first member, the apparatus comprising:
• temperature control means disposed inside of the second member for controlling the temperature of the outer circumferential zone and the temperature of the central zone of the table independently;
• gas supply means for supplying heat conducting gases between the first member and the specimen to the outer circumferential zone and to the inner circumferential zone of the specimen independently;
• and
• control means for controlling the operations of the temperature control means and the gas supply means based on the obtained information with respect to the plural layers of films.

A plasma processing apparatus of processing a specimen placed on a table disposed inside of a processing chamber by using plasmas formed in the processing chamber in which

• the table is disposed to an upper portion thereof and comprises thereon a first member in contact with the specimen and a second member disposed below the first member,
• the apparatus comprising:
• temperature control means disposed inside of the table for controlling the temperature of the outer circumferential zone and the central zone of the table to a first temperature and a second temperature respectively;
• pressure control means for controlling the temperature of a heat conducting gas supplied between the surface of the table and the specimen in contact with the surface to the outer circumferential zone and the inner circumferential zone of the specimen to a first pressure and a second pressure, respectively;
• and
• control means for controlling the operations of the temperature control means and the pressure control means based on the obtained information with respect to the plural layers of the films.