Imprint lithography template having a mold to compensate for material changes of an underlying liquid
AssigneeBoard of Regents, The University of Texas System
InventorsS. V. Sreenivasan, Byung J. Choi, Matthew Colburn, Todd Bailey
Life of this patent
Estimating the term…
Abstract
The present invention includes a template to form a recorded pattern on a substrate from a conformable material disposed between the template and the substrate, with the recorded pattern having recorded features with designed dimensions, the template comprising an original pattern having original features with original dimensions, with the original dimensions differing from the designed dimensions sufficient to compensate for volumetric changes of the conformable material that occurs upon the conformable material transitioning between first and second states.
Claims20
A template to form a recorded pattern on a substrate from a conformable material disposed between said template and said substrate, with said recorded pattern having recorded features with designed dimensions;
- said template comprising:
- an original pattern having original features with original dimensions, with said original dimensions differing from said designed-dimensions sufficient to compensate for volumetric changes of said conformable material that occurs upon said conformable material transitioning between first and second states.
A template to pattern recorded features on a substrate from a conformable material disposed between said template and said substrate, with said recorded features having designed dimensions;
- said template comprising:
- original features having original dimensions, with said original dimensions differing from said designed dimensions sufficient to compensate for volumetric changes of said conformable material that occurs upon said conformable material transitioning between first and second states.
A template to form a recorded pattern on a substrate from a conformable material disposed between said template and said substrate, with said recorded pattern having recorded features with designed dimensions;
- said template comprising:
- an original pattern having original dimensions, said recorded pattern having first dimensions in a first phase state and second dimensions in a second phase state differing from said first dimensions, with said first dimensions being established to compensate for volumetric changes of said conformable material between said first and second phase states to form said second dimensions, with said second dimensions being substantially the same as said designed dimensions.
Dependencies are inferred from the claim text.