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AssigneeNikon Corporation
InventorAndrew J. Hazelton
Estimating the term…
Vibration-attenuation devices and methods are disclosed that utilize a bellows situated between a first and second mass and pressurized with a fluid to an internal fluid pressure substantially equal to a zero-stiffness pressure such that the bellows exhibits a substantially zero lateral stiffness. The devices may include various components configured to measure, regulate, and control the internal pressure of the bellows in order to maintain a desired pressure. The devices may include an active support, such as a secondary bellows or linear actuator, that provides a secondary support force. The active support may be connected to various components configured to measure and control the secondary support force. The vibration-attenuation devices disclosed may be used in a lithography exposure apparatus to attenuate vibrations between: (1) a support frame and a support surface; (2) a base and a stage-supporting platform; and (3) a supporting stage and a wafer stage.
A device for placement between a first mass and a second mass for attenuating transmission of lateral vibration from one of the masses to the other of the masses, the device comprising at least one bellows situated along a respective support axis between the first and second masses and configured to be pressurized with a fluid, the bellows defining an interior volume that is pressurized to an internal fluid pressure substantially equal to a zero-stiffness pressure such that the bellows exhibits a substantially zero lateral stiffness.
A lithographic exposure apparatus, comprising:
An apparatus for supporting a stage in a lithography system comprising:
A lithography system, comprising an apparatus for attenuating transmission of a vibration to and from a wafer stage in the lithography system, the apparatus comprising:
A method for attenuating vibration between a first mass and a second mass, comprising:
Dependencies are inferred from the claim text.