Photo-curable resin composition containing cyclic acetal compound and cured product
AssigneePolyplastics Co., Ltd.
InventorHiroyuki Kanai
Life of this patent
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Abstract
The present invention provides a photo-curable resin composition composed of (A) a cyclic acetal compound, (B) an epoxy compound, and (C) a photocationic polymerization initiator, which has a low viscosity and which can be completely cured into the inside thereof in a short period of irradiation time.
Claims20
A photo-curable resin composition containing (A) a cyclic acetal compound, (B) an epoxy compound, and (C) a photocationic polymerization initiator.
A photo-curable resin composition containing (A) 5 to 80 wt % of a cyclic acetal compound, (B) 94.9 to 20 wt % of an epoxy compound, and (C) 0.1 to 10 wt % of a photocationic polymerization initiator (provided that total of the components (A), (B), and (C) is 100 wt %).
A photo-curable resin composition containing (A) 10 to 40 wt % of a cyclic acetal compound, (B) 89.8 to 60 wt % of an epoxy compound, and (C) 0.2 to 6 wt % of a photocationic polymerization initiator (provided that total of the components (A), (B), and (C) is 100 wt %).
Dependencies are inferred from the claim text.